DocumentCode
1078550
Title
A three-dimensional analysis of semiconductor devices
Author
Yoshii, Akira ; Kitazawa, Hitoshi ; Tomizawa, Masaaki ; Horiguchi, Shoji ; Sudo, Tsuneta
Author_Institution
Nippon Telegraph and Telephone Public Corporation, Tokyo, Japan
Volume
29
Issue
2
fYear
1982
fDate
2/1/1982 12:00:00 AM
Firstpage
184
Lastpage
189
Abstract
An accurate three-dimensional analysis of semiconductor devices based on the general transport equations is carried out. In this analysis, the finite difference formulation and ICCG (Incomplete Choleski and Conjugate Gradient) methods are utilized to reduce computational time and memory requirements. The algorithms are applied to a wide variety of devices, including a bipolar n-p-n transistor, an Integrated Injection Logic (ILL), and a Static Induction Transistor (SIT). Calculated results are compared to those obtained using a conventional two-dimensional simulator. Several three-dimensional effects are modeled successfully. These analyses make it clear that three-dimensional calculation is indispensable for accurate device modeling.
Keywords
Bipolar transistors; Differential equations; Finite difference methods; MOSFETs; Mathematical model; Nonlinear equations; Partial differential equations; Poisson equations; Semiconductor devices; Semiconductor process modeling;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1982.20681
Filename
1482178
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