• DocumentCode
    1078570
  • Title

    Characteristics of high-power and high-breakdown-voltage static induction transistor with the high maximum frequency of oscillation

  • Author

    Kotani, Michio ; Higaki, Yukio ; Kato, Mari ; Yukimoto, Yoshinori

  • Author_Institution
    Mitsubishi Electric Corporation, Itami, Hyogo, Japan
  • Volume
    29
  • Issue
    2
  • fYear
    1982
  • fDate
    2/1/1982 12:00:00 AM
  • Firstpage
    194
  • Lastpage
    198
  • Abstract
    The design and fabrication of high-power and high-breakdown-voltage static induction transistor (SIT) with a high maximum frequency of oscillation are described and then the experimental characteristics are presented. A field plate is used to make the breakdown voltage high, and a fine stripe structure is adopted to make the maximum frequency of oscillation high. As a result, the gate-drain breakdown voltage of 300 V, the gate-source breakdown voltage of 70 V, and the maximum frequency of oscillation of 700 MHz are obtained. The maximum output power of 216 W with 7.5-dB gain and 55- percent drain efficiency is obtained at 100 MHz without a thermal runaway from an amplifying SIT with four pellets mounted in a single package.
  • Keywords
    Doping; Epitaxial layers; Fabrication; Hafnium; Heating; Large scale integration; Power generation; Radio frequency; Semiconductor device packaging; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1982.20683
  • Filename
    1482180