DocumentCode :
1078601
Title :
Short-channel MOSFET VT-VDScharacteristics model based on a point charge and its mirror images
Author :
Ohno, Yasuo
Author_Institution :
Nippon Electric Co., Ltd., Kawasaki, Japan
Volume :
29
Issue :
2
fYear :
1982
fDate :
2/1/1982 12:00:00 AM
Firstpage :
211
Lastpage :
216
Abstract :
Short-channel MOS transistor dV_{T}/dV_{DS} characteristics are expressed by an analytic function of fundamental device parameters. The expression is derived from a simple model of short-channel MOS transistors in threshold condition, which is based on a point charge and its mirror images. With this expression, dV_{T}/dV_{DS} is found to be proportional to 1/L^{2}-1/L^{4} , where L is channel length. Following factors are also found, wherein the source and drain junction depth effect is only logarithmic on dV_{T}/dV_{DS} characteristics, dV_{T}/dV_{SUB} and dV_{T}/dV_{DS} are closely related in short-channel MOS transistors, and short-channel effects are expected to be smaller in MOS transistors on SOS than on bulk silicon, due to a large number of Si/sapphire interface states. This model is simple, and it can be applied to short-channel MOS transistor designing and circuit simulations.
Keywords :
Circuit simulation; DVD; Fabrication; Image analysis; Interface states; Large scale integration; MOSFET circuits; Mirrors; Silicon; Threshold voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1982.20686
Filename :
1482183
Link To Document :
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