• DocumentCode
    1078825
  • Title

    Low-threshold 833-nm GaAsP-AlGaAs tensile-strained quantum-well laser diodes

  • Author

    Sun, D. ; Treat, D.W.

  • Author_Institution
    Xerox Palo Alto Res. Center, CA, USA
  • Volume
    8
  • Issue
    1
  • fYear
    1996
  • Firstpage
    13
  • Lastpage
    15
  • Abstract
    We report the demonstration of TM polarized laser emission at 833 nm from GaAsP-AlGaAs quantum well laser structures grown on GaAs substrates by low-pressure organometallic vapor phase epitaxy for the first time. This is the longest wavelength near infrared TM polarized laser ever reported. Broad area laser diodes containing single GaAs/sub 0.95/P/sub 0.05/ quantum well lased at a low threshold current density of 280 A/cm2 for a cavity length of 1 mm and with a high differential quantum efficiency of 32%/facet for cavity length less than 500 μm.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; quantum well lasers; vapour phase epitaxial growth; 833 nm; GaAsP-AlGaAs; broad area laser diodes; differential quantum efficiency; low-pressure organometallic vapor phase epitaxy; near infrared TM polarized emission; tensile-strained quantum-well lasers; threshold current density; Diode lasers; Epitaxial growth; Gallium arsenide; Laser modes; Laser transitions; Optical polarization; Quantum well lasers; Substrates; Tellurium; Threshold current;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/68.475762
  • Filename
    475762