Title :
Demonstration of an ion-implanted, wavelength-shifted quantum-well laser
Author :
Poole, P.J. ; Charbonneau, S. ; Dion, M. ; Aers, G.C. ; Buchanan, M. ; Goldberg, R.D. ; Mitchell, I.V.
Author_Institution :
Inst. for Microstructural Sci., Nat. Res. Council of Canada, Ottawa, Ont., Canada
Abstract :
A technique for fabricating many different wavelength lasers on the same wafer has been developed. High energy ion implantation was used to selectively blue shift the emission wavelength of an InP-based quantum well laser structure. This structure was then processed into fully functional broad-area lasers whose current threshold was unaffected by the implantation process, indicating extremely high material quality after bandgap-shifting. This process has the potential for the integration of not only different wavelength lasers, but also other devices, such as waveguides, detectors, modulators, etc., on a single wafer.
Keywords :
III-V semiconductors; indium compounds; ion implantation; optical fabrication; quantum well lasers; spectral line shift; InP; bandgap shifting; blue shift; broad-area laser; fabrication; ion implantation; quantum-well laser; threshold current; wafer integration; wavelength shifting; Atomic beams; Etching; Impurities; Indium gallium arsenide; Indium phosphide; Optical materials; Photonic band gap; Quantum well lasers; Rapid thermal annealing; Waveguide lasers;
Journal_Title :
Photonics Technology Letters, IEEE