Title :
A continuous discharge improves the performance of the Cu/CuCl double pulse laser
Author :
Kushner, M.J. ; Culick, F.E.
Author_Institution :
California Institute of Technology, Pasadena, CA, USA
fDate :
9/1/1979 12:00:00 AM
Abstract :
A continuous glow discharge was applied to a Cu/CuCl double pulse laser. Maximum laser pulse energy was observed to increase as much as 35 percent at low buffer gas pressure and 3.5 percent at optimum buffer gas pressure. Minimum and optimum time delays decreased with increasing glow discharge current. The greater pulse energy may be due to increased rate of current rise of the pumping discharge pulse, and decreased contribution to the population of metastable copper from ion recombination.
Keywords :
Gas lasers, atomic; Pulsed lasers; Atomic beams; Copper; Delay effects; Fault location; Gas lasers; Glow discharges; Metastasis; Optical pulses; Pulsed power supplies; Pump lasers;
Journal_Title :
Quantum Electronics, IEEE Journal of
DOI :
10.1109/JQE.1979.1070243
