DocumentCode
1078889
Title
The effect of logic cell configuration, gatelength, and fan-out on the propagation delays of GaAs MESFET logic gates
Author
Namordi, Mooshi R. ; Duncan, Walter M.
Author_Institution
Texas Instruments Inc., Dallas, TX
Volume
29
Issue
3
fYear
1982
fDate
3/1/1982 12:00:00 AM
Firstpage
402
Lastpage
410
Abstract
In this work, three different logic cell configurations, two with and one without a source-follower are employed: These logic cells are arranged in 5- and 11-stage ring oscillator (RO) circuits. The circuits are then fabricated with nominal gatelengths of 0.5, 1.0, 1.5, and 2.0 µm and fan-out loadings of 1, 2, 4, and 8 (consisting of source-gate capacitances). All these test circuits are incorporated into a 6-mm by 6-mm master field. Sufficiently large slices to result in a 4 × 4 array of the master field are used. Si+implantation into
Cr-doped Bridgman and not intentionally doped liquid encapsulated Czochralski (LEC) substrates have been used with success in terms of reproducibility, long range uniformity, and mobility. Since circuit yields are high, each slice provides a sufficiently large data base for a meaningful statistical analysis to be carried out for each circuit type. These data (propagation delay versus circuit type) together with power dissipation results are presented. Preliminary modeling results of the experimental data are also presented.
Cr-doped Bridgman and not intentionally doped liquid encapsulated Czochralski (LEC) substrates have been used with success in terms of reproducibility, long range uniformity, and mobility. Since circuit yields are high, each slice provides a sufficiently large data base for a meaningful statistical analysis to be carried out for each circuit type. These data (propagation delay versus circuit type) together with power dissipation results are presented. Preliminary modeling results of the experimental data are also presented.Keywords
Capacitance; Circuit testing; Gallium arsenide; Logic circuits; Logic gates; MESFETs; Propagation delay; Reproducibility of results; Ring oscillators; Statistical analysis;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1982.20715
Filename
1482212
Link To Document