DocumentCode
1078900
Title
SOS MOSFET two-dimensional analysis
Author
Fukuma, Masao ; Ohno, Yasuo ; Okuto, Yuji
Author_Institution
Nippon Electric Co., Ltd., Kawasaki, Japan
Volume
29
Issue
3
fYear
1982
fDate
3/1/1982 12:00:00 AM
Firstpage
410
Lastpage
413
Abstract
Two-dimensional analysis of short-channel SOS MOSFET´s is presented, The analysis is based on the circular-field-line approximation to determine the boundary conditions in the sapphire substrate. Si-sapphire interface-state effects are taken into account. Using this analysis method, short-channel SOS MOSFET characteristics were investigated. The electric-field lines, originating from the drain, are terminated not only in the Si substrate charge but also in the interface states. The interface states can suppress the short-channel effects in either n- or p-channel SOS MOSFET´s. Predicted characteristics agree with the experimental results.
Keywords
Boundary conditions; Dielectric substrates; Gallium arsenide; Insulation; Interface states; Leakage current; MOSFET circuits; Numerical analysis; Poisson equations; Shape;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1982.20716
Filename
1482213
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