DocumentCode :
1079235
Title :
Analytical HFET I V Model in Presence of Current Collapse
Author :
Koudymov, Alexei ; Shur, Michael S. ; Simin, Grigory ; Chu, Kanin ; Chao, P.C. ; Lee, Cathy ; Jimenez, Jose ; Balistreri, Anthony
Author_Institution :
Rensselaer Polytech. Inst., Troy
Volume :
55
Issue :
3
fYear :
2008
fDate :
3/1/2008 12:00:00 AM
Firstpage :
712
Lastpage :
720
Abstract :
A compact analytical model of short-channel AlGaN/GaN HEMTs in the presence of a current collapse is presented. The model is based on an experimentally established trapping mechanism at the gate edges and relies on significant differences between the characteristic carrier capture-escape times and typical RF signal periods. For the first time, we implement the theory describing electric field distributions in the HEMT gate-to-drain spacing region, with and without trapped charge distributions. By consequently accounting for velocity saturation effects in gated and trapped regions of the device, the presented model shows good agreement with the experimental data. The model uses a minimal number of fitting parameters, most of which are physical parameters describing velocity-field dependence of the carriers.
Keywords :
aluminium compounds; electric fields; high electron mobility transistors; semiconductor device models; AlGaN-GaN; HFET I-V model; current collapse; electric field distribution; gate-to-drain spacing region; trapping mechanism; Aluminum gallium nitride; Analytical models; Chaos; FETs; Fabrication; Gallium nitride; HEMTs; Image analysis; MODFETs; Metal-insulator structures; Compact model; GaN; HEMT; current collapse;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2007.915092
Filename :
4455781
Link To Document :
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