• DocumentCode
    1079235
  • Title

    Analytical HFET I V Model in Presence of Current Collapse

  • Author

    Koudymov, Alexei ; Shur, Michael S. ; Simin, Grigory ; Chu, Kanin ; Chao, P.C. ; Lee, Cathy ; Jimenez, Jose ; Balistreri, Anthony

  • Author_Institution
    Rensselaer Polytech. Inst., Troy
  • Volume
    55
  • Issue
    3
  • fYear
    2008
  • fDate
    3/1/2008 12:00:00 AM
  • Firstpage
    712
  • Lastpage
    720
  • Abstract
    A compact analytical model of short-channel AlGaN/GaN HEMTs in the presence of a current collapse is presented. The model is based on an experimentally established trapping mechanism at the gate edges and relies on significant differences between the characteristic carrier capture-escape times and typical RF signal periods. For the first time, we implement the theory describing electric field distributions in the HEMT gate-to-drain spacing region, with and without trapped charge distributions. By consequently accounting for velocity saturation effects in gated and trapped regions of the device, the presented model shows good agreement with the experimental data. The model uses a minimal number of fitting parameters, most of which are physical parameters describing velocity-field dependence of the carriers.
  • Keywords
    aluminium compounds; electric fields; high electron mobility transistors; semiconductor device models; AlGaN-GaN; HFET I-V model; current collapse; electric field distribution; gate-to-drain spacing region; trapping mechanism; Aluminum gallium nitride; Analytical models; Chaos; FETs; Fabrication; Gallium nitride; HEMTs; Image analysis; MODFETs; Metal-insulator structures; Compact model; GaN; HEMT; current collapse;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2007.915092
  • Filename
    4455781