DocumentCode :
1079322
Title :
Effect of scaling of interconnections on the time delay of VLSI circuits
Author :
Saraswat, Krishna C. ; Mohammadi, Farrokh
Author_Institution :
Stanford University, Stanford, CA
Volume :
29
Issue :
4
fYear :
1982
fDate :
4/1/1982 12:00:00 AM
Firstpage :
645
Lastpage :
650
Abstract :
Effect of scaling of dimensions, i.e., increase in chip size and decrease in minimum feature size, on the RC time delay associated with interconnections in VLSIC´s has been investigated. Analytical expressions have been developed to relate this time delay to various elements of technology, i.e., interconnection material, minimum feature size, chip area, length of the interconnect, etc. Empirical expressions to predict the trends of the technological elements as a function of chronological time have been developed. Calculations of time delay for interconnections made of poly-Si, WSi2, W, and Al have been done and they indicate that as the chip area is increased and other device-related dimensions are decreased the interconnection time delay becomes significant compared to the device time delay and in extreme cases dominates the chip performance.
Keywords :
Conductivity; Delay effects; Dielectric materials; Graphics; Inorganic materials; Integrated circuit interconnections; Integrated circuit technology; Silicides; Silicon; Very large scale integration;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1982.20757
Filename :
1482254
Link To Document :
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