• DocumentCode
    1079553
  • Title

    Annealing of ion implanted silicon using scanned laser and electron beams

  • Author

    Gibbons, J.

  • Author_Institution
    Stanford University, Stanford, CA, USA
  • Volume
    15
  • Issue
    9
  • fYear
    1979
  • fDate
    9/1/1979 12:00:00 AM
  • Firstpage
    989
  • Lastpage
    989
  • Keywords
    Electron-beam applications; Heat treatment; Laser applications, materials processing; Semiconductor defects; Silicon materials/devices; Amorphous silicon; Annealing; Electron beams; Laboratories; Laser beams; Laser modes; Pulsed laser deposition; Semiconductor lasers; Solid lasers; Telephony;
  • fLanguage
    English
  • Journal_Title
    Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9197
  • Type

    jour

  • DOI
    10.1109/JQE.1979.1070304
  • Filename
    1070304
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1079553