DocumentCode
1079788
Title
Narrow track magnetic head fabricated by ion-etching method
Author
Nakanishi, Takuji ; Toshima, Tomoyuki ; Yanagisawa, Keiichi ; Tsuzuki, Nobuyori
Author_Institution
NTT, Musashino-shi, Tokyo, Japan.
Volume
15
Issue
3
fYear
1979
fDate
5/1/1979 12:00:00 AM
Firstpage
1060
Lastpage
1064
Abstract
Manufacturing narrow track magnetic heads is difficult as track widths become very narrow. A new flying-head manufacturing method is established by applying ion-etching. Optimum conditions for ion-etching of the ferrite material were determined. More than 10 μm ion-etched depth and even less than 5 μm track width were obtained. Through experimental and theoretical evaluation, it is proven that ion-etched heads have equivalent or better read/write characteristics than mechanically manufactured heads.
Keywords
Ferrite materials/devices; Ion-beam applications; Magnetic recording/reading heads; Ferrites; Laser beam cutting; Laser beams; Magnetic heads; Magnetic materials; Manufacturing processes; Resists; Surface emitting lasers; Surface waves; Transistors;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1979.1070323
Filename
1070323
Link To Document