DocumentCode :
1079837
Title :
Characteristics of 3D Micro-Structured Semiconductor High Efficiency Neutron Detectors
Author :
Bellinger, S.L. ; McNeil, W.J. ; Unruh, T.C. ; McGregor, D.S.
Author_Institution :
SMART Lab., Kansas State Univ., Manhattan, KS
Volume :
56
Issue :
3
fYear :
2009
fDate :
6/1/2009 12:00:00 AM
Firstpage :
742
Lastpage :
746
Abstract :
Silicon diodes with large aspect ratio perforated micro-structures backfilled with 6LiF show a dramatic increase in neutron detection efficiency beyond that of conventional thin-film coated planar devices. Described in the following are advancements in the technology with increased perforation depths. Perforated silicon diodes with three different etched micro-structure patterns were tested for neutron counting efficiency. The etched micro-structure patterns consisted of circular holes, straight trenches, and continuous sinusoidal waves, with each pattern etched 200 mum deep. Normal incident neutron counting efficiencies were determined to be 9.7%, 12.6%, and 16.2% for circular hole, straight trench, and sinusoidal devices, respectively, at a reverse bias of 3 volts. The perforated neutron detectors demonstrate limited sensitivity to high-energy photon irradiation with a 60Co gamma-ray source. This work is part of on-going research to develop solid-state semiconductor neutron detectors with high detection efficiencies and uniform angular responses.
Keywords :
counting circuits; etching; gamma-ray effects; neutron detection; silicon radiation detectors; thin films; 3D microstructured semiconductor high efficiency neutron detectors; 60Co gamma-ray source; 6LiF; continuous sinusoidal waves; etched microstructure patterns; high-energy photon irradiation; normal incident neutron counting efficiency; silicon diodes; thin-film coated planar devices; uniform angular responses; Etching; Gamma ray detection; Gamma ray detectors; Gas detectors; Neutrons; Semiconductor diodes; Semiconductor thin films; Silicon; Testing; Thin film devices; Neutron detectors; perforated diode;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.2008.2006682
Filename :
5076081
Link To Document :
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