DocumentCode :
1080137
Title :
Compensation mechanism in liquid encapsulated Czochralski GaAs: Importance of melt stoichiometry
Author :
Holmes, D.E. ; Chen, R.T. ; Elliott, Kenneth R. ; Kirkpatrick, C.G. ; Yu, Phil Won
Author_Institution :
Rockwell International, Thousand Oaks, CA
Volume :
29
Issue :
7
fYear :
1982
fDate :
7/1/1982 12:00:00 AM
Firstpage :
1045
Lastpage :
1051
Abstract :
It is shown that the key to reproducible growth of undoped semi-insulating GaAs by the liquid encapsulated Czochralski (LEC) technique is the control over the melt stoichiometry. Twelve crystals were grown from stoichiometric and nonstoichiometric melts. The material was characterized by secondary ion mass spectrometry, localized vibrational mode far infrared spectroscopy, Hall-effect measurements, optical absorption, and photoluminescence. A quantitative model for the Compensation mechanism in the semi-insulating material was developed based on these measurements. The free carrier concentration is controlled by the balance between EL2 deep donors and carbon acceptors; furthermore, the incorporation of EL2 is controlled by the melt stoichiometry, increasing as the As atom fraction in the melt increases. As a result, semi-insulating material can be grown only from melts above a critical As composition. The practical significance of these results is discussed in terms of achieving high yield and reproduciblity in the crystal growth process.
Keywords :
Crystalline materials; Crystals; Electromagnetic wave absorption; Gallium arsenide; Infrared spectra; Mass spectroscopy; Optical materials; Particle beam optics; Semiconductor materials; Vibration measurement;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1982.20832
Filename :
1482329
Link To Document :
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