DocumentCode :
1080484
Title :
Modeling of MOS transistors with nonrectangular-gate geometries
Author :
Grignoux, Patrice ; Geiger, Randall L.
Author_Institution :
The Centre National d´´Etudes des Télécommunication, Paris, France
Volume :
29
Issue :
8
fYear :
1982
fDate :
8/1/1982 12:00:00 AM
Firstpage :
1261
Lastpage :
1269
Abstract :
The dc electrical characteristics of MOS transistors with nonrectangular-gate geometries are investigated. Closed-form analytical expressions relating the terminal characteristics to the geometric parameters are presented for several gate geometries including the trapezoid, "V," "L," and annulus. Experimental results based upon a specially fabricated NMOS test bar containing these nonrectangular devices are presented. A comparison of the theoretical and experimental results is made which shows close agreement.
Keywords :
Data mining; Design engineering; Electric variables; Geometry; Helium; MOS devices; MOSFET circuits; Shape control; Solid modeling; Testing;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1982.20865
Filename :
1482362
Link To Document :
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