• DocumentCode
    1081006
  • Title

    Gate-drain avalanche breakdown in GaAs power MESFET´s

  • Author

    David, John P R ; Sitch, John E. ; Stern, Michael S.

  • Author_Institution
    University of Sheffield, Sheffield, England
  • Volume
    29
  • Issue
    10
  • fYear
    1982
  • fDate
    10/1/1982 12:00:00 AM
  • Firstpage
    1548
  • Lastpage
    1552
  • Abstract
    The voltage breakdown behavior of a number of different MESFET structures has been investigated using a two-dimensional numerical model. The site of the avalanche is found to be under the drain edge of the gate in recessed devices under all bias conditions, but moves towards the drain contact in planar structures when the channel is not pinched off. The dependence of the breakdown voltage on a variety of geometrical and physical variables has been studied. In particular the surface is shown to play an important part in determining the breakdown voltage.
  • Keywords
    Avalanche breakdown; Doping; Electrodes; Gallium arsenide; Geometry; MESFETs; Numerical models; Power generation; Stability criteria; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1982.20913
  • Filename
    1482410