DocumentCode :
1081006
Title :
Gate-drain avalanche breakdown in GaAs power MESFET´s
Author :
David, John P R ; Sitch, John E. ; Stern, Michael S.
Author_Institution :
University of Sheffield, Sheffield, England
Volume :
29
Issue :
10
fYear :
1982
fDate :
10/1/1982 12:00:00 AM
Firstpage :
1548
Lastpage :
1552
Abstract :
The voltage breakdown behavior of a number of different MESFET structures has been investigated using a two-dimensional numerical model. The site of the avalanche is found to be under the drain edge of the gate in recessed devices under all bias conditions, but moves towards the drain contact in planar structures when the channel is not pinched off. The dependence of the breakdown voltage on a variety of geometrical and physical variables has been studied. In particular the surface is shown to play an important part in determining the breakdown voltage.
Keywords :
Avalanche breakdown; Doping; Electrodes; Gallium arsenide; Geometry; MESFETs; Numerical models; Power generation; Stability criteria; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1982.20913
Filename :
1482410
Link To Document :
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