DocumentCode
1081006
Title
Gate-drain avalanche breakdown in GaAs power MESFET´s
Author
David, John P R ; Sitch, John E. ; Stern, Michael S.
Author_Institution
University of Sheffield, Sheffield, England
Volume
29
Issue
10
fYear
1982
fDate
10/1/1982 12:00:00 AM
Firstpage
1548
Lastpage
1552
Abstract
The voltage breakdown behavior of a number of different MESFET structures has been investigated using a two-dimensional numerical model. The site of the avalanche is found to be under the drain edge of the gate in recessed devices under all bias conditions, but moves towards the drain contact in planar structures when the channel is not pinched off. The dependence of the breakdown voltage on a variety of geometrical and physical variables has been studied. In particular the surface is shown to play an important part in determining the breakdown voltage.
Keywords
Avalanche breakdown; Doping; Electrodes; Gallium arsenide; Geometry; MESFETs; Numerical models; Power generation; Stability criteria; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1982.20913
Filename
1482410
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