DocumentCode
1081100
Title
Analysis and capacitive measurement of the built-in-field parameter in highly doped emitters
Author
Fortini, André ; Hairie, Alain ; Gomina, Moussa
Author_Institution
Laboratoire de Physique des Solides de l´´Université de Caen, Caen cedex, France
Volume
29
Issue
10
fYear
1982
fDate
10/1/1982 12:00:00 AM
Firstpage
1604
Lastpage
1610
Abstract
An elementary theory of a strongly asymmetric n+-n-p junction, assuming an exponential tail of the donor concentration profile in the depletion layer, is presented and supported by numerical computations. The drastic effect of the built-in field upon the minority carrier flow is discussed. A detailed expression of the static capacitance is then derived and shown to lead to an improved measurement of the
law, capable of yielding the internal field parameter around the edge of the depletion layer in the emitter. Typical experimental results are reported and discussed.
law, capable of yielding the internal field parameter around the edge of the depletion layer in the emitter. Typical experimental results are reported and discussed.Keywords
Bipolar transistors; Capacitance; Diodes; Doping; Fabrication; Impurities; Ion implantation; Photovoltaic cells; Silicon; Tail;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1982.20921
Filename
1482418
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