DocumentCode :
1081100
Title :
Analysis and capacitive measurement of the built-in-field parameter in highly doped emitters
Author :
Fortini, André ; Hairie, Alain ; Gomina, Moussa
Author_Institution :
Laboratoire de Physique des Solides de l´´Université de Caen, Caen cedex, France
Volume :
29
Issue :
10
fYear :
1982
fDate :
10/1/1982 12:00:00 AM
Firstpage :
1604
Lastpage :
1610
Abstract :
An elementary theory of a strongly asymmetric n+-n-p junction, assuming an exponential tail of the donor concentration profile in the depletion layer, is presented and supported by numerical computations. The drastic effect of the built-in field upon the minority carrier flow is discussed. A detailed expression of the static capacitance is then derived and shown to lead to an improved measurement of the C(V) law, capable of yielding the internal field parameter around the edge of the depletion layer in the emitter. Typical experimental results are reported and discussed.
Keywords :
Bipolar transistors; Capacitance; Diodes; Doping; Fabrication; Impurities; Ion implantation; Photovoltaic cells; Silicon; Tail;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1982.20921
Filename :
1482418
Link To Document :
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