• DocumentCode
    1081100
  • Title

    Analysis and capacitive measurement of the built-in-field parameter in highly doped emitters

  • Author

    Fortini, André ; Hairie, Alain ; Gomina, Moussa

  • Author_Institution
    Laboratoire de Physique des Solides de l´´Université de Caen, Caen cedex, France
  • Volume
    29
  • Issue
    10
  • fYear
    1982
  • fDate
    10/1/1982 12:00:00 AM
  • Firstpage
    1604
  • Lastpage
    1610
  • Abstract
    An elementary theory of a strongly asymmetric n+-n-p junction, assuming an exponential tail of the donor concentration profile in the depletion layer, is presented and supported by numerical computations. The drastic effect of the built-in field upon the minority carrier flow is discussed. A detailed expression of the static capacitance is then derived and shown to lead to an improved measurement of the C(V) law, capable of yielding the internal field parameter around the edge of the depletion layer in the emitter. Typical experimental results are reported and discussed.
  • Keywords
    Bipolar transistors; Capacitance; Diodes; Doping; Fabrication; Impurities; Ion implantation; Photovoltaic cells; Silicon; Tail;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1982.20921
  • Filename
    1482418