DocumentCode
1081161
Title
Hot-electron limited operating voltages for 0.8-µm MOSFET´s
Author
Shiono, Noboru ; Hashimoto, Chisato
Author_Institution
Nippon Telegraph and Telephone Public Corporation, Musashino-shi, Tokyo, Japan
Volume
29
Issue
10
fYear
1982
fDate
10/1/1982 12:00:00 AM
Firstpage
1630
Lastpage
1632
Abstract
The maximum allowable operating voltage limited by hot-electrons for 0.8-µm MOSFET´s, VGS = VDS , is determined to be 5.5 V at room temperature with VSUB = -2 V, as a result of long-term stress aging. Slow and fast threshold-voltage shifts are observed depending on stress conditions, i.e., the amount of hot-electrons injected into the gate SiO2 . Generation of interface trapped charges at the Si-SiO2 interface near the drain junction is suggested as a main cause for degradation.
Keywords
Aging; Boron; Current measurement; Degradation; Electrons; Intrusion detection; Stress; Temperature; Threshold voltage; Transconductance;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1982.20926
Filename
1482423
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