• DocumentCode
    1081161
  • Title

    Hot-electron limited operating voltages for 0.8-µm MOSFET´s

  • Author

    Shiono, Noboru ; Hashimoto, Chisato

  • Author_Institution
    Nippon Telegraph and Telephone Public Corporation, Musashino-shi, Tokyo, Japan
  • Volume
    29
  • Issue
    10
  • fYear
    1982
  • fDate
    10/1/1982 12:00:00 AM
  • Firstpage
    1630
  • Lastpage
    1632
  • Abstract
    The maximum allowable operating voltage limited by hot-electrons for 0.8-µm MOSFET´s, VGS= VDS, is determined to be 5.5 V at room temperature with VSUB= -2 V, as a result of long-term stress aging. Slow and fast threshold-voltage shifts are observed depending on stress conditions, i.e., the amount of hot-electrons injected into the gate SiO2. Generation of interface trapped charges at the Si-SiO2interface near the drain junction is suggested as a main cause for degradation.
  • Keywords
    Aging; Boron; Current measurement; Degradation; Electrons; Intrusion detection; Stress; Temperature; Threshold voltage; Transconductance;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1982.20926
  • Filename
    1482423