Title :
Hot-electron limited operating voltages for 0.8-µm MOSFET´s
Author :
Shiono, Noboru ; Hashimoto, Chisato
Author_Institution :
Nippon Telegraph and Telephone Public Corporation, Musashino-shi, Tokyo, Japan
fDate :
10/1/1982 12:00:00 AM
Abstract :
The maximum allowable operating voltage limited by hot-electrons for 0.8-µm MOSFET´s, VGS= VDS, is determined to be 5.5 V at room temperature with VSUB= -2 V, as a result of long-term stress aging. Slow and fast threshold-voltage shifts are observed depending on stress conditions, i.e., the amount of hot-electrons injected into the gate SiO2. Generation of interface trapped charges at the Si-SiO2interface near the drain junction is suggested as a main cause for degradation.
Keywords :
Aging; Boron; Current measurement; Degradation; Electrons; Intrusion detection; Stress; Temperature; Threshold voltage; Transconductance;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1982.20926