• DocumentCode
    1081304
  • Title

    IIA-5 a JMOS transistor fabricated with 100A low pressure nitrided-oxide gate dielectric

  • Author

    Sodini, Charlie G. ; Wong, S. Simon ; Oldham, W.G.

  • Volume
    29
  • Issue
    10
  • fYear
    1982
  • fDate
    10/1/1982 12:00:00 AM
  • Firstpage
    1662
  • Lastpage
    1663
  • Keywords
    Boron; Computer simulation; Dielectric devices; Electron mobility; Implants; MOS devices; MOSFETs; Performance evaluation; Very large scale integration; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1982.20941
  • Filename
    1482438