DocumentCode
1081320
Title
AlGaAs/GaAs based HEMTs, inverters and ring oscillators with InGaAs and AlGaAs etch-stop layers
Author
Ren, Fengyuan ; Pearton, S.J. ; Kopf, R.F. ; Chu, S.N.G. ; Pei, S.S.
Author_Institution
AT&T Bell Labs., Murray Hill, NJ, USA
Volume
27
Issue
13
fYear
1991
fDate
6/20/1991 12:00:00 AM
Firstpage
1175
Lastpage
1177
Abstract
Direct coupled FET logic (DCFL) inverters and 19 stage ring oscillators have been demonstrated with MBE grown AlGaAs/GaAs HEMTs using a dry-etching gate recess technology. Pseudomorphic In0.3Ga0.7As and Al0.3Ga0.7As were used as etch-stop layers for depleted mode ungated, saturated resistors and enhancement mode FETs, respectively, to achieve excellent uniformities of threshold voltage and saturation current. The maximum extrinsic transconductance of 1.2 mu m gate length devices was 289 mS/mm with 1.35 Omega mm source resistance. The logic swing and noise margins were 0.5 and 0.2 V, respectively. The propagation delay of a 19 stage ring oscillator was 31.5 ps/stage at 300 degrees C.
Keywords
III-V semiconductors; aluminium compounds; field effect integrated circuits; gallium arsenide; high electron mobility transistors; integrated logic circuits; oscillators; 1.2 micron; 289 mS; Al 0.3Ga 0.7As; AlGaAs-GaAs; DCFL; HEMTs; In 0.3Ga 0.7As; MBE grown; depleted mode ungated; direct coupled FET logic; dry-etching gate recess technology; enhancement mode; etch-stop layers; inverters; maximum extrinsic transconductance; pseudomorphic semiconductors; ring oscillators; saturated resistors;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19910733
Filename
132735
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