• DocumentCode
    1081320
  • Title

    AlGaAs/GaAs based HEMTs, inverters and ring oscillators with InGaAs and AlGaAs etch-stop layers

  • Author

    Ren, Fengyuan ; Pearton, S.J. ; Kopf, R.F. ; Chu, S.N.G. ; Pei, S.S.

  • Author_Institution
    AT&T Bell Labs., Murray Hill, NJ, USA
  • Volume
    27
  • Issue
    13
  • fYear
    1991
  • fDate
    6/20/1991 12:00:00 AM
  • Firstpage
    1175
  • Lastpage
    1177
  • Abstract
    Direct coupled FET logic (DCFL) inverters and 19 stage ring oscillators have been demonstrated with MBE grown AlGaAs/GaAs HEMTs using a dry-etching gate recess technology. Pseudomorphic In0.3Ga0.7As and Al0.3Ga0.7As were used as etch-stop layers for depleted mode ungated, saturated resistors and enhancement mode FETs, respectively, to achieve excellent uniformities of threshold voltage and saturation current. The maximum extrinsic transconductance of 1.2 mu m gate length devices was 289 mS/mm with 1.35 Omega mm source resistance. The logic swing and noise margins were 0.5 and 0.2 V, respectively. The propagation delay of a 19 stage ring oscillator was 31.5 ps/stage at 300 degrees C.
  • Keywords
    III-V semiconductors; aluminium compounds; field effect integrated circuits; gallium arsenide; high electron mobility transistors; integrated logic circuits; oscillators; 1.2 micron; 289 mS; Al 0.3Ga 0.7As; AlGaAs-GaAs; DCFL; HEMTs; In 0.3Ga 0.7As; MBE grown; depleted mode ungated; direct coupled FET logic; dry-etching gate recess technology; enhancement mode; etch-stop layers; inverters; maximum extrinsic transconductance; pseudomorphic semiconductors; ring oscillators; saturated resistors;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19910733
  • Filename
    132735