Title : 
AlGaAs/GaAs based HEMTs, inverters and ring oscillators with InGaAs and AlGaAs etch-stop layers
         
        
            Author : 
Ren, Fengyuan ; Pearton, S.J. ; Kopf, R.F. ; Chu, S.N.G. ; Pei, S.S.
         
        
            Author_Institution : 
AT&T Bell Labs., Murray Hill, NJ, USA
         
        
        
        
        
            fDate : 
6/20/1991 12:00:00 AM
         
        
        
        
            Abstract : 
Direct coupled FET logic (DCFL) inverters and 19 stage ring oscillators have been demonstrated with MBE grown AlGaAs/GaAs HEMTs using a dry-etching gate recess technology. Pseudomorphic In0.3Ga0.7As and Al0.3Ga0.7As were used as etch-stop layers for depleted mode ungated, saturated resistors and enhancement mode FETs, respectively, to achieve excellent uniformities of threshold voltage and saturation current. The maximum extrinsic transconductance of 1.2 mu m gate length devices was 289 mS/mm with 1.35 Omega mm source resistance. The logic swing and noise margins were 0.5 and 0.2 V, respectively. The propagation delay of a 19 stage ring oscillator was 31.5 ps/stage at 300 degrees C.
         
        
            Keywords : 
III-V semiconductors; aluminium compounds; field effect integrated circuits; gallium arsenide; high electron mobility transistors; integrated logic circuits; oscillators; 1.2 micron; 289 mS; Al 0.3Ga 0.7As; AlGaAs-GaAs; DCFL; HEMTs; In 0.3Ga 0.7As; MBE grown; depleted mode ungated; direct coupled FET logic; dry-etching gate recess technology; enhancement mode; etch-stop layers; inverters; maximum extrinsic transconductance; pseudomorphic semiconductors; ring oscillators; saturated resistors;
         
        
        
            Journal_Title : 
Electronics Letters
         
        
        
        
        
            DOI : 
10.1049/el:19910733