DocumentCode :
1081531
Title :
Line-drawing interpretation: bilateral symmetry
Author :
Nalwa, Vishvjit S.
Author_Institution :
Robotics Lab., Stanford Univ., CA, USA
Volume :
11
Issue :
10
fYear :
1989
fDate :
10/1/1989 12:00:00 AM
Firstpage :
1117
Lastpage :
1120
Abstract :
Results previously derived by the author are used to investigate the implication of bilateral symmetry in line drawings. It is shown that the line drawing of an orthographically protected surface of revolution exhibits bilateral symmetry about the projection of its axis of revolution irrespective of the viewing direction. Barring one exception, a bilaterally symmetric line drawing is necessarily the orthographic projection of a local surface of revolution whenever its symmetry axis continues to be the projection of a fixed line in space under perturbation of viewpoint; the axis of revolution is the invariant preimage of the symmetry axis. Various line-drawing causes are detailed which facilitate the deduction of invariant preimages of symmetry axes, and consequently of local surfaces of revolution
Keywords :
pattern recognition; picture processing; bilateral symmetry; line drawing interpretation; orthographic projection; pattern recognition; picture processing; symmetry axis; Computer vision; Extraterrestrial measurements; Geometry; Graphics; Humans; Lamps; Layout; Psychology; Reflection; Robots;
fLanguage :
English
Journal_Title :
Pattern Analysis and Machine Intelligence, IEEE Transactions on
Publisher :
ieee
ISSN :
0162-8828
Type :
jour
DOI :
10.1109/34.42842
Filename :
42842
Link To Document :
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