Title :
IIIB-3 verification of models for the annealing of arsenic implants
Author :
Wilson, C.L. ; Roitman, P. ; Albers, J.
fDate :
10/1/1982 12:00:00 AM
Keywords :
Annealing; Calibration; Circuits; Electron beams; Implants; Ion implantation; Measurement techniques; Predictive models; Silicon; Voltage;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1982.20963
