Title :
Characteristics of Gate-All-Around Junctionless Poly-Si TFTs With an Ultrathin Channel
Author :
Hung-Bin Chen ; Chun-Yen Chang ; Nan-Heng Lu ; Jia-Jiun Wu ; Ming-Hung Han ; Ya-Chi Cheng ; Yung-Chun Wu
Author_Institution :
Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
Abstract :
This letter demonstrates for the first time junctionless (JL) gate-all-around (GAA) poly-Si thin-film transistors (TFTs) with ultrathin channels (2 nm). The subthreshold swing is 61 mV/decade and the ON/OFF current ratio is close to 108 because of the excellent gate controllability and ultrathin channel. The JL-GAA TFTs have a low drain-induced barrier lowering value of 6 mV/V, indicating greater suppression of the short-channel effect than in JL-planar TFTs. The cumulative distribution of electrical parameters in JL-GAA is small. Therefore, the proposed JL-GAA TFTs of excellent device characteristics along with simple fabrication are highly promising for future system-on-panel and system-on-chip applications.
Keywords :
elemental semiconductors; silicon; thin film transistors; Si; drain-induced barrier lowering value; gate controllability; gate-all-around junctionless poly-Si TFT; short-channel effect; subthreshold swing; thin-film transistors; ultrathin channel; Gate-all-around (GAA); junctionless (JL); thin-film transistor; ultrathin channel;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2013.2262018