Title : 
VB-1 an N-channel In0.53Ga0.47As plasma oxide insulated gate inversion-mode fet
         
        
            Author : 
Liao, A.S.H. ; Tell, B. ; Leheny, R.F. ; Chang, T.Y. ; Nahory, R.E.
         
        
            Author_Institution : 
Bell Laboratories, Holmdel, New Jersey
         
        
        
        
        
            fDate : 
10/1/1982 12:00:00 AM
         
        
        
        
            Keywords : 
Electron devices; Electron mobility; FETs; High-speed electronics; Indium gallium arsenide; Insulation; Optoelectronic devices; Plasma devices; Plasma materials processing; Plasma waves;
         
        
        
            Journal_Title : 
Electron Devices, IEEE Transactions on
         
        
        
        
        
            DOI : 
10.1109/T-ED.1982.20990