Title :
VB-1 an N-channel In0.53Ga0.47As plasma oxide insulated gate inversion-mode fet
Author :
Liao, A.S.H. ; Tell, B. ; Leheny, R.F. ; Chang, T.Y. ; Nahory, R.E.
Author_Institution :
Bell Laboratories, Holmdel, New Jersey
fDate :
10/1/1982 12:00:00 AM
Keywords :
Electron devices; Electron mobility; FETs; High-speed electronics; Indium gallium arsenide; Insulation; Optoelectronic devices; Plasma devices; Plasma materials processing; Plasma waves;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1982.20990