DocumentCode
1082009
Title
Piezoelectrically actuated tunable capacitor
Author
Lee, Chuang-Yuan ; Kim, Eun Sok
Author_Institution
Dept. of Electr. Eng.-Electrophys., Univ. of Southern California, Los Angeles, CA
Volume
15
Issue
4
fYear
2006
Firstpage
745
Lastpage
755
Abstract
This paper describes the design, fabrication, and characterization of the first MEMS piezoelectric tunable capacitors employing zinc oxide (ZnO) actuation. Relatively simple design rules for the device-structure optimization for largest deflection are shown from simulation results based on theoretical equations. The ZnO-actuated tunable capacitors are accordingly designed and fabricated with both surface and bulk micromachining techniques. Through the surface micromachining process, sacrificial silicon is removed with XeF2, and parylene is successfully used as a supporting layer for a piezoelectric unimorph cantilever. For comparison, other two different structures using plasma-enhanced chemical-vapor deposition (PECVD) SiN and SU-8 as supporting layers are also fabricated. Deflection analyses are performed for three specific structures, among which the parylene-supported one is demonstrated to have the largest displacement and most suitable for tunable capacitor application. For bulk-micromachined tunable capacitor, we have implemented a novel design of a large structure driven by a ZnO unimorph, and obtained a tuning ratio of more than 21:1 (0.46 pF-10.02 pF). This is the highest tuning ratio reported to date for parallel-plate tunable capacitors while requiring an applied voltage of only 35 V
Keywords
II-VI semiconductors; capacitors; microactuators; micromachining; piezoelectric actuators; wide band gap semiconductors; zinc compounds; 0.46 to 10.02 pF; 35 V; MEMS piezoelectric tunable capacitors; SU-8 layer; SiN; ZnO; bulk micromachining technique; parylene; piezoelectric actuator; piezoelectric unimorph cantilever; plasma-enhanced chemical-vapor deposition; sacrificial silicon; supporting layers; surface micromachining technique; Capacitors; Design optimization; Equations; Fabrication; Micromachining; Micromechanical devices; Plasma applications; Plasma chemistry; Silicon; Zinc oxide; Parylene; tunable capacitor; zinc oxide;
fLanguage
English
Journal_Title
Microelectromechanical Systems, Journal of
Publisher
ieee
ISSN
1057-7157
Type
jour
DOI
10.1109/JMEMS.2006.878886
Filename
1668169
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