An Optimized Scalable BSIM Macromodel for HV Double-Diffused Drain MOSFET ${I}$ – ${V}$ Charac

This letter presents a scalable macromodel dedicated to the I-V characteristics of the high-voltage double diffused drain metal oxide semiconductor field effect transistor (MOSFET), which can be widely used in SPICE simulators and electronic design automation tools. The scalable model has been validated for different device geometries: large dimension (L = 20 mum, W = 20 mum), narrow dimension (L =20 mum, W = 1.8 mum/2 mum/5 mum), and short dimension (L = 1.2 mum/1.5 mum/2 mum/3 mum/5 mum, W = 20 mum). The variable-resistance feature of the lightly-doped drain has been simulated by metal semiconductor FET and diode, instead of by variable resistance which the Berkeley short channel insulated gate field effect transistor model (BSIM) does not support. This approach not only improves the utility value of the macromodel, but also considers the physical effects of the high-voltage MOSFET. Furthermore, this scalable macromodel can be applied to the modeling software tools based on the SPICE BSIM model.