• DocumentCode
    1082835
  • Title

    An Analytical Expression for Drain Saturation Voltage of Polycrystalline Silicon Thin-Film Transistors

  • Author

    Hao, Han ; Wang, Mingxiang ; Wong, Man

  • Author_Institution
    Soochow Univ., Suzhou
  • Volume
    29
  • Issue
    4
  • fYear
    2008
  • fDate
    4/1/2008 12:00:00 AM
  • Firstpage
    357
  • Lastpage
    359
  • Abstract
    A physical-based analytical expression for the drain saturation voltage VDsat of polycrystalline silicon (poly-Si) thin- film transistors (TFTs) is derived. VDsat is found to be dominated by the grain boundary potential barrier modulation effect, which can be readily estimated from the device transfer characteristic. Straightforward prediction of VDsat values at arbitrarily given gate voltages based on the proposed formula is demonstrated for both low temperature and high temperature processed poly-Si TFTs in either n- or p-type. The prediction agrees well with experimentally determined VDsat value. Derivation of the expression is based on our previously proposed analytical ON-state drain-current model for poly-Si TFTs, with no empirical factors included.
  • Keywords
    semiconductor device models; silicon; thin film transistors; device transfer characteristic; drain saturation voltage model; grain boundary potential barrier modulation effect; polycrystalline silicon TFT; thin-film transistors; Drain saturation voltage; output characteristic; polycrystalline silicon; thin-film transistors (TFTs);
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2008.917810
  • Filename
    4457860