DocumentCode :
1082955
Title :
Band-structure engineering to control impact ionisation and related high-field processes
Author :
Adams, A.R.
Author_Institution :
Sch. of Electron. & Phys. Sci., Univ. of Surrey, Guildford, UK
Volume :
40
Issue :
17
fYear :
2004
Firstpage :
1086
Lastpage :
1088
Abstract :
Alloying with even small amounts of highly mismatched atoms can have dramatic and beneficial effects on the electronic band structure of semiconductors. For example, dilute amounts of nitrogen in GaAsN or GaInAsN may cause considerable disruption of the conduction band while leaving the valence band relatively unaltered. This means that the impact ionisation rate of electrons can be made much smaller than the rate for holes leading, for example, to the production of low-noise avalanche photodiodes.
Keywords :
III-V semiconductors; Monte Carlo methods; avalanche breakdown; avalanche photodiodes; conduction bands; energy gap; gallium arsenide; gallium compounds; impact ionisation; indium compounds; valence bands; wide band gap semiconductors; GaAsN; GaInAsN; Monte Carlo methods; band-structure engineering; conduction band; electronic band structure; high-field processes; impact ionisation control; low-noise avalanche photodiodes; nitrogen dilute amounts; semiconductors; valence band;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:20046315
Filename :
1327541
Link To Document :
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