DocumentCode :
1083061
Title :
High-performance GaAs metal insulator semiconductor transistor
Author :
Fleming, P.L. ; Meulenberg, A., Jr. ; Carlson, H.E.
Author_Institution :
Comsat Laboratories, Clarksburg, MD
Volume :
3
Issue :
4
fYear :
1982
fDate :
4/1/1982 12:00:00 AM
Firstpage :
104
Lastpage :
105
Abstract :
Proton bombardment techniques have been used to fabricate GaAs metal insulator semiconductor transistors (MIST´s) with good thermal stability and radiation hardened performance. Highly stable insulator layers have been obtained using both single-species (H1+) and multiple-species (H1+, H2+, O+, and OH+) beams. The device processing is compatible with fabrication of GaAs FET devices in monolithic circuits.
Keywords :
Annealing; Circuit stability; Fabrication; Gallium arsenide; Implants; Insulation; Metal-insulator structures; Molecular beam epitaxial growth; Protons; Thermal stability;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1982.25497
Filename :
1482602
Link To Document :
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