DocumentCode :
108319
Title :
Large-Area MgB2 Films Fabricated by Scaled-Up Hybrid Physical - Chemical Vapor Deposition
Author :
Teng Tan ; Chenggang Zhuang ; Krick, A. ; Ke Chen ; Xi, X.X.
Author_Institution :
Dept. of Phys., Temple Univ., Philadelphia, PA, USA
Volume :
23
Issue :
3
fYear :
2013
fDate :
Jun-13
Firstpage :
7500304
Lastpage :
7500304
Abstract :
A scaled-up hybrid physical-chemical vapor deposition (HPCVD) method has been developed to fabricate large-area high-quality magnesium diboride (MgB2) thin films. The 2-in-diameter MgB2 thin films on sapphire (0001) show uniform superconducting properties, including Tc ~ 39 K, residual-resistivity ratio ~ 14, and Jc (4.2 K) ~ 107 A/cm2. X-ray diffraction showed that the films are epitaxial with c-axis normal to the film surface. The film properties are uniform across the 2-in substrate.
Keywords :
X-ray diffraction; chemical vapour deposition; electrical resistivity; magnesium compounds; superconducting epitaxial layers; superconducting materials; Al2O3; MgB2; X-ray diffraction; XRD; film properties; film surface; large-area high-quality magnesium diboride thin films; residual-resistivity ratio; scaled-up hybrid physical-chemical vapor deposition method; size 2 in; superconducting properties; Conductivity; Heating; Magnetic field measurement; Substrates; Superconducting epitaxial layers; Temperature measurement; $hbox{MgB}_{2}$; Hybrid physical–chemical vapor deposition (HPCVD); superconducting films; superconducting materials;
fLanguage :
English
Journal_Title :
Applied Superconductivity, IEEE Transactions on
Publisher :
ieee
ISSN :
1051-8223
Type :
jour
DOI :
10.1109/TASC.2012.2234822
Filename :
6397584
Link To Document :
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