DocumentCode
1083456
Title
Accumulation-punchthrough mode of operation of buried-channel MOSFET´s
Author
Ratnam, P. ; Bhattacharyya, A.B.
Author_Institution
Indian Institute of Technology, New Delhi, India
Volume
3
Issue
7
fYear
1982
fDate
7/1/1982 12:00:00 AM
Firstpage
203
Lastpage
204
Abstract
The current-voltage characteristics of a buried-channel MOSFET operated in a "punchthrough-accumulation" mode, when the neutral implanted channel is completely depleted due to punchthrough by substrate bias and an accumulation layer is induced by the gate, are demonstrated. It is shown that the value of one of the device model parameters, φMS , used under the above mode of operation corresponds to the gate and the substrate rather than to the gate and the channel.
Keywords
Channel bank filters; Current-voltage characteristics; Degradation; Equations; Large scale integration; MOSFET circuits; P-n junctions; Threshold voltage;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1982.25538
Filename
1482643
Link To Document