• DocumentCode
    1083546
  • Title

    Experimental comparisons in the electrical performance of long and ultrashort gate length GaAs MESFET´s

  • Author

    Chao, P.C. ; Ku, W.H. ; Nulman, J.

  • Author_Institution
    Cornell University, Ithaca, NY, USA
  • Volume
    3
  • Issue
    8
  • fYear
    1982
  • fDate
    8/1/1982 12:00:00 AM
  • Firstpage
    187
  • Lastpage
    190
  • Abstract
    Electrical properties of GaAs single-gate and dual-gate MESFET´s with gate lengths of 1.2 µm and 0.2 µm have been compared. By reducing the gate length to 0.2 µm, a very high zero-gate-bias drain current Idssand a large increase in the pinchoff voltage were observed in both single-gate and dual-gate devices, Idssin the shorter gate FET was found to be very close to the full channel current. Only a slight improvement in the maximum intrinsic gmwas noted in the 0.2 µm FET´s. The knee voltage for the zero-gate-bias curve was larger in the shorter gate FET. At low current levels, soft pinchoff and soft saturation behaviors were observed in the very short gate FET´s. A striking feature of the GaAs MESFET is that its output conductance at large drain voltages does not degrade with shorter gate lengths.
  • Keywords
    Conducting materials; Degradation; FETs; Fabrication; Gallium arsenide; Knee; MESFETs; Resists; Transconductance; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1982.25546
  • Filename
    1482651