DocumentCode :
1083546
Title :
Experimental comparisons in the electrical performance of long and ultrashort gate length GaAs MESFET´s
Author :
Chao, P.C. ; Ku, W.H. ; Nulman, J.
Author_Institution :
Cornell University, Ithaca, NY, USA
Volume :
3
Issue :
8
fYear :
1982
fDate :
8/1/1982 12:00:00 AM
Firstpage :
187
Lastpage :
190
Abstract :
Electrical properties of GaAs single-gate and dual-gate MESFET´s with gate lengths of 1.2 µm and 0.2 µm have been compared. By reducing the gate length to 0.2 µm, a very high zero-gate-bias drain current Idssand a large increase in the pinchoff voltage were observed in both single-gate and dual-gate devices, Idssin the shorter gate FET was found to be very close to the full channel current. Only a slight improvement in the maximum intrinsic gmwas noted in the 0.2 µm FET´s. The knee voltage for the zero-gate-bias curve was larger in the shorter gate FET. At low current levels, soft pinchoff and soft saturation behaviors were observed in the very short gate FET´s. A striking feature of the GaAs MESFET is that its output conductance at large drain voltages does not degrade with shorter gate lengths.
Keywords :
Conducting materials; Degradation; FETs; Fabrication; Gallium arsenide; Knee; MESFETs; Resists; Transconductance; Voltage;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1982.25546
Filename :
1482651
Link To Document :
بازگشت