DocumentCode :
1083615
Title :
Heavily-doped semiconductor lasers
Author :
Copeland, John A.
Author_Institution :
Bell Labs., Holmdel, NJ, USA
Volume :
17
Issue :
11
fYear :
1981
fDate :
11/1/1981 12:00:00 AM
Firstpage :
2187
Lastpage :
2190
Abstract :
A theoretical study of the effect of heavily doping the active layer of a semiconductor laser shows that the minority carrier density required to reach inversion decreases with increasing doping. Unfortunately, the minority carrier lifetime also decreases since there is a component of the recombination rate that is proportional to the doping density. It is found that for a dopant with a recombination rate coefficient K_{B}, 5E-10 cm3/s (Zn in GaAs), the inversion current density has a local minimum at zero doping, but decreases again for n-type doping above 1E18 /cm, and is one third of the zero value at 4E18 /cm. The value of KBfor other dopants and materials is unknown; however, for a dopant with a coefficient smaller than 5E-11 , the inversion current would be less than one tenth the zero value at 4E18 n-type, and would also decrease with the addition of p-type dopant. These results indicate that by heavily doping the active layer with the proper dopant, one might obtain both faster response and a lower threshold current, particularly with n-type dopants.
Keywords :
Semiconductor device doping; Semiconductor lasers; Charge carrier density; Charge carrier lifetime; Current density; Gallium arsenide; Laser theory; Radiative recombination; Semiconductor device doping; Semiconductor lasers; Threshold current; Zinc;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/JQE.1981.1070680
Filename :
1070680
Link To Document :
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