• DocumentCode
    1083760
  • Title

    Special Section on The International Symposium on Semiconductor Manufacturing

  • Author

    Otsuka, N. ; Uchino, T.

  • Volume
    20
  • Issue
    3
  • fYear
    2007
  • Firstpage
    193
  • Lastpage
    194
  • Abstract
    The eleven papers in this special section were originally presented at the 15th International Symposium on Semiconductor Manufacturing (ISSM), held on September 25-27, 2006, in Tokyo, Japan.
  • Keywords
    CMOS process; CMOS technology; Electron beams; Leak detection; Manufacturing industries; Metrology; Paper technology; Productivity; Semiconductor device manufacture; Special issues and sections;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/TSM.2007.901954
  • Filename
    4285824
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1083760