• DocumentCode
    1083840
  • Title

    A direct measurement of interfacial contact resistance

  • Author

    Proctor, S.J. ; Linholm, L.W.

  • Author_Institution
    National Bureau of Standards, Washington, DC
  • Volume
    3
  • Issue
    10
  • fYear
    1982
  • fDate
    10/1/1982 12:00:00 AM
  • Firstpage
    294
  • Lastpage
    296
  • Abstract
    A method is described for directly measuring interfacial contact resistance and estimating the degree of uniformity of the interfacial layer in metal-semiconductor contacts. A two-dimensional resistor network model is used to obtain a relationship between the specific contact resistance and the measured interfacial contact resistance for contacts with a homogeneous interfacial layer. Measurement results are given for 98.5% Al/1.5% Si and 100 % Al contacts on n-type silicon.
  • Keywords
    Circuit testing; Conductors; Contact resistance; Current measurement; Electrical resistance measurement; Integrated circuit measurements; Integrated circuit reliability; Probes; Semiconductor devices; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1982.25574
  • Filename
    1482679
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1083840