• DocumentCode
    1083898
  • Title

    Linear CCD-Imagers with a polyimide insulation for double level metallization

  • Author

    Theuwissen, A.J.P. ; Declerck, G.J.

  • Author_Institution
    Catholic University Leuven, Heverlee, Belgium
  • Volume
    3
  • Issue
    10
  • fYear
    1982
  • fDate
    10/1/1982 12:00:00 AM
  • Firstpage
    308
  • Lastpage
    309
  • Abstract
    CCD-imagers have been fabricated with a double metallization and with polyimide (PI) as insulating layer between the two metals. The incorporation of PI reduces the complexity of the CCD-technology without changing the electrical and the optical properties of the imaging devices. In addition, the sensor uniformity is strongly improved due to the enhanced surface flatness.
  • Keywords
    Aluminum; Atmosphere; Insulation; Metallization; Optical sensors; Plasma temperature; Polyimides; Surface topography; Threshold voltage; Wet etching;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1982.25579
  • Filename
    1482684
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1083898