DocumentCode :
1084898
Title :
Design model for bulk CMOS scaling enabling accurate latchup prediction
Author :
Wieder, Armin W. ; Werner, Christoph ; Harter, Johann
Author_Institution :
Siemens AG, Munich, Federal Republic of Germany
Volume :
30
Issue :
3
fYear :
1983
fDate :
3/1/1983 12:00:00 AM
Firstpage :
240
Lastpage :
245
Abstract :
The integration density of advanced bulk CMOS structures heavily depends on SCR type of latch up. Depending on the technology chosen the n-p-n-p-n-p interaction, which can be fired by noise, destroys tile stored information or even the chip itself. This paper presents the first complete two-dimensional numerical analysis for a typical CMOS structure including latchup path in the "OFF," "ON," "firing" and "sustaining" mode. Results and experimental data are discussed and used to develop a simplified, yet accurate CMOS design model. This allows the calculation of the firing and sustaining edge depending on geometrical and processing data.
Keywords :
CMOS process; CMOS technology; Charge carrier processes; Doping; Poisson equations; Predictive models; Semiconductor device modeling; Thyristors; Two dimensional displays; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1983.21107
Filename :
1483008
Link To Document :
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