• DocumentCode
    1085317
  • Title

    How the ZnS:Mn layer thickness contributes to the performance of AC thin-film EL devices grown by atomic layer epitaxy (ALE)

  • Author

    Törnqvist, Runar O. ; Antson, Jorma ; Skarp, Jarmo ; Tanninen, Veli Pekka

  • Author_Institution
    Lohja Corporation, Espoo, Finland
  • Volume
    30
  • Issue
    5
  • fYear
    1983
  • fDate
    5/1/1983 12:00:00 AM
  • Firstpage
    468
  • Lastpage
    471
  • Abstract
    Luminance, efficiency, threshold voltage, and voltage polarity dependence of the light emission have been investigated as a function of the ZnS:Mn layer thickness in ac thin-film electroluminescent (TFEL) devices grown by Atomic Layer Epitaxy (ALE). The crystallinity of the ZnS:Mn layer was studied by X-ray diffraction. The layer of poor crystallinity is about 35 nm and coincides with the dead layer observed in luminance. Luminance is nearly proportional to the ZnS:Mn layer thickness and might indicate a homogeneous excitation throughout the layer at high voltages.
  • Keywords
    Atomic layer deposition; Crystallization; Epitaxial growth; Glass; Manganese; Sputtering; Thin film devices; Threshold voltage; X-ray diffraction; Zinc compounds;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1983.21149
  • Filename
    1483050