DocumentCode
1085317
Title
How the ZnS:Mn layer thickness contributes to the performance of AC thin-film EL devices grown by atomic layer epitaxy (ALE)
Author
Törnqvist, Runar O. ; Antson, Jorma ; Skarp, Jarmo ; Tanninen, Veli Pekka
Author_Institution
Lohja Corporation, Espoo, Finland
Volume
30
Issue
5
fYear
1983
fDate
5/1/1983 12:00:00 AM
Firstpage
468
Lastpage
471
Abstract
Luminance, efficiency, threshold voltage, and voltage polarity dependence of the light emission have been investigated as a function of the ZnS:Mn layer thickness in ac thin-film electroluminescent (TFEL) devices grown by Atomic Layer Epitaxy (ALE). The crystallinity of the ZnS:Mn layer was studied by X-ray diffraction. The layer of poor crystallinity is about 35 nm and coincides with the dead layer observed in luminance. Luminance is nearly proportional to the ZnS:Mn layer thickness and might indicate a homogeneous excitation throughout the layer at high voltages.
Keywords
Atomic layer deposition; Crystallization; Epitaxial growth; Glass; Manganese; Sputtering; Thin film devices; Threshold voltage; X-ray diffraction; Zinc compounds;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1983.21149
Filename
1483050
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