Title :
Neodymium-doped silica-based planar waveguide lasers
Author :
Kitagawa, Takeshi ; Hattori, Kuninori ; Hibino, Yoshinori ; Ohmori, Yasuji
Author_Institution :
NTT Opto-Electron. Labs., Ibaraki, Japan
fDate :
3/1/1994 12:00:00 AM
Abstract :
Fabrication and lasing characteristics of Nd-doped P2O 5-SiO2 core planar waveguide lasers are described. CW oscillation at a wavelength of 1052.5 nm was successfully demonstrated in 0.2 wt%-Nd-doped silica-based planar waveguides fabricated on a silicon substrate by flame hydrolysis deposition and reactive ion etching. The lasing threshold and slope efficiency were optimized in an 8-μm-wide waveguide, in which a lasing threshold pump power of 26 mW and a slope efficiency of 2.0% were obtained for 805-nm pumping. The measured lasing characteristics agreed with theoretical characteristics calculated by employing finite-element waveguide analysis, indicating that the waveguide structure was well controlled by the developed waveguide fabrication technique. The possible lasing characteristics of the waveguide lasers are discussed based on this agreement. The attenuation and emission properties of the waveguides are also described
Keywords :
neodymium; optical pumping; optical waveguides; optical workshop techniques; solid lasers; sputter etching; 1052.5 nm; 2 percent; 26 mW; 805 nm; Nd-doped silica-based planar waveguide lasers; P2O5-SiO2:Nd; emission properties; finite-element waveguide analysis; flame hydrolysis deposition; lasing characteristics; lasing threshold; lasing threshold pump power; reactive ion etching; silicon substrate; slope efficiency; waveguide fabrication technique; waveguide structure; Etching; Finite element methods; Fires; Laser theory; Optical device fabrication; Planar waveguides; Pump lasers; Silicon; Waveguide lasers; Waveguide theory;
Journal_Title :
Lightwave Technology, Journal of
