DocumentCode :
1085728
Title :
Reduction of leakage current of 4H-SIC pin diodes after UV light exposure
Author :
Wolborski, M. ; Bakowski, M. ; Schöner, A.
Author_Institution :
Dept. of Microelectron. & Appl. Phys., R. Inst. of Technol., Kista
Volume :
43
Issue :
2
fYear :
2007
Firstpage :
130
Lastpage :
131
Abstract :
A substantial reduction of the leakage current in 4H-SiC pin diodes is observed after <10 eV UV irradiation in air. The high energy UV is believed to remove carbon clusters from the SiC surface. Comparison of leakage current in 4H-SiC pin diodes after different surface treatments, including reactive ion etching, exposure to two different sources of UV light and different forms of chemical cleaning, is presented. Exposure to 4.9 eV UV light in nitrogen atmosphere enhances the leakage by one order of magnitude
Keywords :
leakage currents; p-i-n diodes; silicon compounds; ultraviolet radiation effects; 4.9 eV; 4H-SiC; SiC; UV irradiation; UV light exposure; chemical cleaning; leakage current reduction; pin diodes; reactive ion etching; surface treatments;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:20073494
Filename :
4084126
Link To Document :
بازگشت