• DocumentCode
    1085825
  • Title

    Performance limiting micropipe defects in silicon carbide wafers

  • Author

    Neudeck, Philip G. ; Powell, J.Anthony

  • Author_Institution
    NASA Lewis Res. Center, Cleveland, OH, USA
  • Volume
    15
  • Issue
    2
  • fYear
    1994
  • Firstpage
    63
  • Lastpage
    65
  • Abstract
    Reports on the characteristics of a major defect in mass-produced silicon carbide wafers which severely limits the performance of silicon carbide power devices. Micropipe defects originating in 4H- and 6H-SiC substrates were found to cause pre-avalanche reverse-bias point failures in most epitaxially-grown pn junction devices of 1 mm/sup 2/ or larger in area. Until such defects are significantly reduced from their present density (on the order of 100´s of micropipes/cm/sup 2/), silicon carbide power device ratings will be restricted to around several amps or less.<>
  • Keywords
    p-n homojunctions; power electronics; semiconductor materials; silicon compounds; SiC; defect density; device ratings; epitaxially-grown pn junction devices; micropipe defects; power devices; power semiconductors; pre-avalanche reverse-bias point failures; Breakdown voltage; Conducting materials; Electric breakdown; Power semiconductor devices; Semiconductor diodes; Semiconductor materials; Silicon carbide; Solid state circuits; Substrates; Thermal conductivity;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.285372
  • Filename
    285372