Title :
Bipolar transistor with minimized collector-to-base junction area
Author_Institution :
IBM General Technology Division, Hopewell Junction, NY
fDate :
6/1/1983 12:00:00 AM
Abstract :
A novel n-p-n bipolar transistor structure with polysilicon base contacts and minimized collector-to-base junction area is described. Device data obtained for this structure show that while device parameters dependent on the device doping profile remain unaffected, a considerable improvement is obtained in device parameters dependent on the size of the collector-to-base junction area.
Keywords :
Bipolar transistors; Boron; Doping profiles; Electron devices; Fabrication; Impurities; Iterative methods; Nonlinear equations; Oxidation; Very large scale integration;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1983.21200