DocumentCode :
1085850
Title :
Bipolar transistor with minimized collector-to-base junction area
Author :
Antipov, Igor
Author_Institution :
IBM General Technology Division, Hopewell Junction, NY
Volume :
30
Issue :
6
fYear :
1983
fDate :
6/1/1983 12:00:00 AM
Firstpage :
723
Lastpage :
726
Abstract :
A novel n-p-n bipolar transistor structure with polysilicon base contacts and minimized collector-to-base junction area is described. Device data obtained for this structure show that while device parameters dependent on the device doping profile remain unaffected, a considerable improvement is obtained in device parameters dependent on the size of the collector-to-base junction area.
Keywords :
Bipolar transistors; Boron; Doping profiles; Electron devices; Fabrication; Impurities; Iterative methods; Nonlinear equations; Oxidation; Very large scale integration;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1983.21200
Filename :
1483101
Link To Document :
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