Title :
Laser annealing and crystallization of silicon
Author_Institution :
Bell Labs., Murray Hill, NJ USA
fDate :
12/1/1981 12:00:00 AM
Keywords :
Annealing; Crystallization; Current measurement; Magnetic field measurement; Plasma density; Plasma measurements; Plasma waves; Scattering; Silicon; Tokamaks;
Journal_Title :
Quantum Electronics, IEEE Journal of
DOI :
10.1109/JQE.1981.1070888
