Impact of Lithographic Grid Irregularity Assessed on Photonic Crystal Device Selectivity

Author

Martinelli, Lucio ; Benisty, Henri ; Drisse, Olivier ; Derouin, Estelle ; Pommereau, Frederic ; Legouézigou, Odile ; Duan, Guang-Hua

Author_Institution

Lab. Charles Fabry de l´´Inst. d´´Optique, CNRS, Palaiseau

Volume

19

Issue

5

fYear

2007

fDate

3/1/2007 12:00:00 AM

Firstpage

282

Lastpage

284

Abstract

The gridding irregularities of electron beam lithography may deterministically disorder photonic crystals (PhC). Their practical impact is addressed on a PhC wavelength selective device using a large grid size of 8 nm. The device operation, based on confined resonances and propagation mini-stopbands in a multimode waveguide, is deterministically blurred. Scattering length scales are correspondingly discussed. Strategies for higher throughput lithography are proposed accordingly

Keywords

demultiplexing; electron beam lithography; optical communication equipment; optical fibre communication; optical planar waveguides; photonic crystals; wavelength division multiplexing; 8 nm; demultiplexing; electron beam lithography; lithographic grid irregularity; ministopband propagation; multimode waveguide; optical communication device; photonic crystal device selectivity; photonic crystals; photonic integrated circuits; planar photonic crystals; scattering length scales; wavelength division multiplexing; wavelength selective device; Electron beams; Lithography; Optical scattering; Optical waveguides; Particle scattering; Photonic crystals; Resonance; Semiconductor waveguides; Throughput; Wavelength division multiplexing; Demultiplexing; electron beam lithography; multimode waveguides (WGs); optical communications;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2007.891238

Filename

4084552