Title :
Impact of Lithographic Grid Irregularity Assessed on Photonic Crystal Device Selectivity
Author :
Martinelli, Lucio ; Benisty, Henri ; Drisse, Olivier ; Derouin, Estelle ; Pommereau, Frederic ; Legouézigou, Odile ; Duan, Guang-Hua
Author_Institution :
Lab. Charles Fabry de l´´Inst. d´´Optique, CNRS, Palaiseau
fDate :
3/1/2007 12:00:00 AM
Abstract :
The gridding irregularities of electron beam lithography may deterministically disorder photonic crystals (PhC). Their practical impact is addressed on a PhC wavelength selective device using a large grid size of 8 nm. The device operation, based on confined resonances and propagation mini-stopbands in a multimode waveguide, is deterministically blurred. Scattering length scales are correspondingly discussed. Strategies for higher throughput lithography are proposed accordingly
Keywords :
demultiplexing; electron beam lithography; optical communication equipment; optical fibre communication; optical planar waveguides; photonic crystals; wavelength division multiplexing; 8 nm; demultiplexing; electron beam lithography; lithographic grid irregularity; ministopband propagation; multimode waveguide; optical communication device; photonic crystal device selectivity; photonic crystals; photonic integrated circuits; planar photonic crystals; scattering length scales; wavelength division multiplexing; wavelength selective device; Electron beams; Lithography; Optical scattering; Optical waveguides; Particle scattering; Photonic crystals; Resonance; Semiconductor waveguides; Throughput; Wavelength division multiplexing; Demultiplexing; electron beam lithography; multimode waveguides (WGs); optical communications;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2007.891238
