DocumentCode
1086405
Title
A general solution method for two-dimensional nonplanar oxidation
Author
Chin, Daeje ; Oh, Soo-Young ; Dutton, Robert W.
Author_Institution
IBM Thomas J. Watson Research Center, Yorktown Heights, NY
Volume
30
Issue
9
fYear
1983
fDate
9/1/1983 12:00:00 AM
Firstpage
993
Lastpage
998
Abstract
Two-dimensional oxidation is a moving-boundary problem involving steady-state oxidant diffusion and incompressible viscous flow. To solve the kinetic equations for the two-dimensional oxidation model, this work introduces a general numerical method that combines pressure/ velocity iteration with a boundary-value technique.
Keywords
Atomic layer deposition; Chemical elements; Chemical technology; Equations; Etching; Kinetic theory; Oxidation; Shape; Silicon; Steady-state;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1983.21252
Filename
1483153
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