DocumentCode :
1086724
Title :
GaInAsP/InP semiconductor vertical GRIN-lens for semiconductor optical devices
Author :
El Yumin, S. ; Komori, Kenji ; Arai, S.
Author_Institution :
Dept. of Phys. Electron., Tokyo Inst. of Technol., Japan
Volume :
6
Issue :
5
fYear :
1994
fDate :
5/1/1994 12:00:00 AM
Firstpage :
601
Lastpage :
604
Abstract :
A GaInAsP/InP vertical GRIN-lens (VGL), which is suitable for monolithic integration with semiconductor laser diodes (LDs) or semiconductor laser amplifiers (SLAs), was fabricated for the first time. A narrow FWHM of vertical far-field pattern of 6 degree was experimentally obtained with 8 layers of GRIN core region (8 μm thick) and InP cladding layers. An integration of this VGL with a taper waveguide SLA with the output width of 10 μm was also demonstrated.
Keywords :
III-V semiconductors; gallium arsenide; gallium compounds; gradient index optics; indium compounds; integrated optics; integrated optoelectronics; lenses; semiconductor lasers; 8 mum; GRIN core region; GaInAsP-InP; GaInAsP/InP semiconductor vertical GRIN-lens; InP cladding layers; monolithic integration; narrow FWHM; output width; semiconductor laser amplifiers; semiconductor laser diodes; semiconductor optical devices; taper waveguide SLA; vertical far-field pattern; Indium phosphide; Laser beams; Lenses; Optical devices; Optical waveguides; Refractive index; Semiconductor lasers; Semiconductor optical amplifiers; Semiconductor waveguides; Waveguide lasers;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/68.285554
Filename :
285554
Link To Document :
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