Title :
Pulsed and cw laser annealing of polysilicon films
Author :
Wilson, Stuart ; Paulson, W. ; White, Connor
Author_Institution :
Motorola, Inc., Phoenix, AZ, USA
fDate :
12/1/1981 12:00:00 AM
Keywords :
Absorption; Annealing; Chemical lasers; Dielectric substrates; Optical pulses; Power lasers; Pulsed laser deposition; Semiconductor films; Silicon; Thermal expansion;
Journal_Title :
Quantum Electronics, IEEE Journal of
DOI :
10.1109/JQE.1981.1070980