DocumentCode :
1086881
Title :
Pulsed and cw laser annealing of polysilicon films
Author :
Wilson, Stuart ; Paulson, W. ; White, Connor
Author_Institution :
Motorola, Inc., Phoenix, AZ, USA
Volume :
17
Issue :
12
fYear :
1981
fDate :
12/1/1981 12:00:00 AM
Firstpage :
2492
Lastpage :
2492
Keywords :
Absorption; Annealing; Chemical lasers; Dielectric substrates; Optical pulses; Power lasers; Pulsed laser deposition; Semiconductor films; Silicon; Thermal expansion;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/JQE.1981.1070980
Filename :
1070980
Link To Document :
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