Title :
Si-based surface-relief polygonal gratings for 1-to-many wafer scale optical clock signal distribution
Author :
Chen, R.T. ; Feiming Li ; Dubinovsky, M. ; Ershov, O.
Author_Institution :
Microelectron. Res. Center, Texas Univ., Austin, TX, USA
Abstract :
In contrast to volume holographic material where 1-to-many fanouts are realized using multiplexed volume holograms, we report in this paper the first Si-based surface-relief polygonal gratings aiming at optical clock signal distribution application. Surface-relief gratings with 1-μm period (0.5 μm feature size) were fabricated using reactive ion beam etching (RIE). Both hexagonal and square gratings were demonstrated for 1-to-4 and 1-to-6 fanouts. Surface-normal input and output coupling schemes were carried out with an combined coupling efficiency of 65%. Employment of substrate modes in silicon greatly releases the required grating spacing for the demonstrated two-way surface-normal coupling. 7.5 GHz 1-to-4 clock signal distribution operating at 1.3 μm was demonstrated with a signal-to-noise ratio as high as 60 dB. The intensity fluctuation among fanout beams was measured to be within 1 dB. Generalization of 1-to-many fanout can be realized by implementing a polygonal grating with an equivalent number of facets.
Keywords :
clocks; diffraction gratings; elemental semiconductors; holographic gratings; integrated optics; optical couplers; optical fabrication; optical interconnections; silicon; sputter etching; 1-to-4 fanouts; 1-to-6 fanouts; 1-to-many fanouts; 1-to-many wafer scale optical clock signal distribution; 1.3 mum; 65 percent; 7.5 GHz; Si; Si-based surface-relief polygonal gratings; clock signal distribution; coupling efficiency; fanout beams; grating spacing; hexagonal gratings; intensity fluctuation; multiplexed volume holograms; optical clock signal distribution application; polygonal grating; reactive ion beam etching; signal-to-noise ratio; square gratings; substrate modes; surface-normal input coupling schemes; surface-normal output coupling schemes; surface-relief gratings; two-way surface-normal coupling; Clocks; Employment; Etching; Gratings; Holographic optical components; Holography; Ion beams; Optical materials; Particle beam optics; Silicon;
Journal_Title :
Photonics Technology Letters, IEEE