DocumentCode :
1087049
Title :
Gain characteristics of a distributed IMPATT device
Author :
Soohoo, Jack
Author_Institution :
San Francisco State University, San Francisco, CA
Volume :
30
Issue :
10
fYear :
1983
fDate :
10/1/1983 12:00:00 AM
Firstpage :
1405
Lastpage :
1406
Abstract :
We have analyzed the gain characteristics of a distributed IMPATT device for CW power generation in the microwave and millimeter-wave regions. The results indicate that the structure has high-gain and wide-band characteristics. With Si as diode material, the calculated gain is greater than 200 dB per centimeter over a wide range of frequencies.
Keywords :
CMOS process; CMOS technology; Cutoff frequency; Distributed power generation; Electron devices; Maxwell equations; Microwave devices; Semiconductor diodes; Solid state circuits; Wideband;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1983.21309
Filename :
1483210
Link To Document :
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