Title :
Monolithic integration of multilayer filter on vertical surface of semiconductor substrate by a bias-sputtering technique
Author :
Baba, T. ; Tamura, S. ; Kokubun, Y. ; Watanabe, S.
Author_Institution :
Div. of Electr. & Comput. Eng., Yokohama Nat. Univ., Japan
fDate :
3/1/1990 12:00:00 AM
Abstract :
The selective formation of dielectric film on a vertical surface of a substrate by a bias-sputtering technique is discussed. Using this technique it has been possible to achieve the monolithic integration of a multilayer wavelength filter and waveguide photodetector on a vertical surface of a semiconductor substrate. The wavelength filter can be applied to an integrated demultiplexer and photodetector by fabricating an optical waveguide directly on the substrate.<>
Keywords :
integrated optics; optical filters; optical waveguides; photodetectors; semiconductors; sputter deposition; substrates; bias-sputtering technique; dielectric film; integrated demultiplexer; monolithic integration; multilayer filter; multilayer wavelength filter; optical waveguide; semiconductor substrate; sputter deposition; vertical surface; waveguide photodetector; Dielectric films; Dielectric substrates; Monolithic integrated circuits; Nonhomogeneous media; Optical filters; Optical surface waves; Optical waveguides; Photodetectors; Semiconductor waveguides; Surface waves;
Journal_Title :
Photonics Technology Letters, IEEE
